Calculate oxide and channel capacitance from key device inputs. Compare overlap and total values instantly. Visualize trends, test assumptions, and optimize switching behavior confidently.
The example below uses a typical sample input set for a quick engineering check.
| Width (um) | Length (um) | Tox (nm) | k | Overlap (nm) | Fingers | Region | Total Cgg (pF) | Gate Charge at 5 V (pC) |
|---|---|---|---|---|---|---|---|---|
| 120 | 1.2 | 12 | 3.9 | 80 | 2 | Saturation | 0.6796 | 3.3980 |
εox = k × ε0
Where ε0 is the vacuum permittivity and k is the relative dielectric constant.
Cox,density = εox / tox
This gives capacitance per unit area and depends strongly on oxide thickness.
Cox,total = Cox,density × W × L × Nf
This is the ideal geometric oxide capacitance before region-based scaling.
Cintrinsic = Region Factor × Cox,total
Typical factors used here are 0 for cutoff, 1 for linear, 2/3 for saturation, and the chosen depletion factor for subthreshold.
Coverlap = 2 × Cox,density × W × Lov × Nf
The factor of 2 represents source-side and drain-side gate overlap.
Cfringing = Fringing Factor × Coverlap
This estimates field fringing around gate edges in a practical layout.
Cgg = Cintrinsic + Coverlap + Cfringing
This total can then be used to estimate switching burden and gate charge.
Qg = Cgg × Vg
This gives a first-pass charge requirement for the chosen gate drive voltage.
It estimates oxide capacitance, intrinsic gate capacitance, overlap capacitance, fringing capacitance, Cgs, Cgd, total Cgg, EOT, and gate charge from common MOS gate inputs.
Gate-channel charge distribution changes with region. Linear operation usually produces larger effective intrinsic capacitance than saturation, while cutoff drives intrinsic channel capacitance toward zero.
Overlap capacitance comes from the gate extending over source and drain diffusion regions. It is extrinsic, geometry-driven, and remains important even when channel charge is reduced.
It is a practical multiplier that estimates additional edge-field capacitance not captured by simple parallel-plate overlap calculations. Use measured or process-based values when available.
No. It is excellent for early engineering estimates, sensitivity studies, and tradeoff reviews. Final signoff should still use foundry models, extracted parasitics, and simulation tools.
Equivalent oxide thickness converts a non-silicon-dioxide dielectric into the SiO2 thickness that would give the same capacitance density. It helps compare different gate stacks fairly.
Gate charge links capacitance to drive effort. It helps estimate how much charge a driver must source or sink for a chosen gate voltage swing.
Yes. The number of fingers scales total active gate area and overlap contribution, making the result more representative of segmented device layouts.
Important Note: All the Calculators listed in this site are for educational purpose only and we do not guarentee the accuracy of results. Please do consult with other sources as well.