Advanced Oxide Growth Calculator

Predict oxide thickness using established engineering relationships. Explore trends, compare scenarios, and export project-ready results. Built for faster evaluations across fabrication and thermal studies.

Calculator inputs

Choose preset coefficients for a quick estimate, or enter custom A and B values for calibrated process data.

Reset form
Engineering note: Preset coefficients are useful for fast screening. Use custom constants when your line, furnace, chemistry, or wafer history needs calibrated values.

Example data table

These sample rows use preset coefficients and show how thickness changes with different ambients, temperatures, and process times.

Example Ambient Temperature (°C) Time (hr) Initial thickness (um) Final thickness (um)
Case 1 Dry 950.00 1.00 0.0200 0.0463
Case 2 Dry 1,050.00 2.00 0.0300 0.1439
Case 3 Wet 950.00 0.50 0.0100 0.2014
Case 4 Wet 1,100.00 1.50 0.0500 0.8430

Formula used

This calculator applies the Deal–Grove linear-parabolic oxidation model:

x² + Ax = B(t + τ)

Here, x is final oxide thickness, A is the linear constant in um, B is the parabolic constant in um²/hr, t is process time in hours, and τ adjusts for starting oxide.

The closed-form thickness solution is:

x = [-A + √(A² + 4B(t + τ))] / 2

The time-shift term comes from the starting thickness:

τ = (xᵢ² + Axᵢ) / B

The target-time inversion uses:

t = (xₜ² + Axₜ) / B - τ

Scope reminder: This model is best for thermal oxide systems that follow linear-parabolic growth behavior, commonly used for silicon oxidation estimates.

How to use this calculator

  1. Select preset mode for a quick engineering estimate.
  2. Choose dry or wet oxidation ambient.
  3. Enter the oxidation temperature in degrees Celsius.
  4. Enter total process time in hours.
  5. Enter the initial oxide thickness before growth begins.
  6. Optionally enter a target thickness for time comparison.
  7. Adjust the calibration multiplier to reflect plant behavior.
  8. Switch to custom mode when you already know A and B.
  9. Press the calculate button to show results above the form.
  10. Review the metrics, chart, and export options for reporting.

Frequently asked questions

1) What does this oxide growth calculator estimate?

It estimates final oxide thickness, added growth, average growth rate, and target time using a linear-parabolic oxidation model. It also visualizes thickness over time.

2) When should I use dry oxidation versus wet oxidation?

Dry oxidation usually grows slower and can support thinner, denser films. Wet oxidation usually grows faster and is often chosen when thicker oxide is needed.

3) What does the linear constant A represent?

A indicates the transition scale between interface-limited and diffusion-limited behavior. Smaller thickness values relative to A usually lean toward the linear region.

4) What does the parabolic constant B represent?

B governs diffusion-driven growth. Larger B values usually increase thickness more strongly at longer oxidation times, especially once films become thicker.

5) Why would I enter custom A and B values?

Use custom values when you have measured line data, tool-specific calibration, or internal process models. That approach usually gives better agreement than generic presets.

6) What is the purpose of the time-shift term τ?

τ accounts for an existing starting oxide. It lets the model begin from the initial film instead of incorrectly assuming a bare surface at time zero.

7) Can this calculator replace fab qualification data?

No. It supports estimation and comparison. Final process decisions should still rely on metrology, tool qualification, wafer history, and local calibration results.

8) Which units does the calculator use?

Temperature uses degrees Celsius. Time uses hours. Thickness and A use micrometers. B uses micrometers squared per hour, and B/A uses micrometers per hour.

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Important Note: All the Calculators listed in this site are for educational purpose only and we do not guarentee the accuracy of results. Please do consult with other sources as well.