Model ion energy, masses, angle, and binding. Get yield, removed atoms, and thickness together instantly. Use the calculator for faster sputtering estimates and checks.
Enter your sputtering inputs below. Then press calculate to show the result here above the form.
| Ion | Target | Energy (eV) | Angle (deg) | Yield (atoms/ion) | Thickness (nm) |
|---|---|---|---|---|---|
| Ar+ | Copper | 500 | 0 | 2.5732 | 2.4245 |
| Ar+ | Silicon | 1000 | 30 | 4.6284 | 11.1187 |
| Kr+ | Aluminum | 1500 | 45 | 7.8532 | 11.7278 |
This tool uses a simple engineering estimate for sputter yield.
Y = alpha × Sn × M × ((E − Eth) / Us) × A(theta)
M = 4M1M2 / (M1 + M2)²
A(theta) = min(3, (1 / cos(theta))^0.60)
If ion energy is not above threshold energy, the calculator sets sputter yield to zero. Thickness removal is then derived from removed atoms, atomic weight, density, and sputtered area.
Sputter yield shows how many target atoms leave a surface per incoming ion. It is a key number in plasma processing, thin film work, ion milling, and surface cleaning. Engineers use it to estimate removal rate, target wear, and coating uniformity. A good first estimate saves test time.
Ion energy strongly affects momentum transfer. Higher energy usually raises sputter yield until other limits appear. Ion mass also matters. Heavy ions often transfer momentum more efficiently to the target. Target atom mass changes the collision balance. Surface binding energy resists atom removal. Stronger binding usually lowers yield.
Incidence angle changes how collision cascades develop near the surface. Yield often rises at moderate angles and then becomes less reliable near grazing incidence. This is why the calculator includes an angle factor but also gives a caution note at very high angles. It helps with practical planning, not final qualification.
Yield alone is useful, but thickness loss is often the engineering target. The calculator converts removed atoms into mass, volume, and thickness. Density and atomic weight make that conversion possible. This is helpful for target life reviews, etch budgeting, and comparing materials under the same ion dose.
A simple sputter yield calculator is best for screening studies, early design checks, and fast comparison work. It can support chamber setup, beam selection, and first-pass erosion estimates. It also helps explain trends between ion energy, incidence angle, and target properties. For production settings, always compare estimates with measured sputter data and calibrated process runs.
Sputter yield is the average number of target atoms ejected by one incoming ion. It is usually written in atoms per ion and helps estimate erosion and material removal.
Ion energy controls how much momentum can be transferred into the target. More available energy above threshold usually increases sputter yield, although real systems can become more complex at higher energies.
Threshold energy represents the minimum energy needed before sputtering becomes meaningful. If the ion energy does not exceed this level, the calculator sets the yield to zero.
It is suitable for quick engineering estimates across many materials. It is not a replacement for measured sputter data, detailed Monte Carlo simulation, or process-specific calibration.
The efficiency factor lets you tune the simple model to better match expected behavior. It helps account for empirical differences that the basic equation does not fully capture.
At off-normal angles, collision cascades can deposit energy nearer the surface. That often improves atom ejection. Near grazing angles, however, real yields can deviate sharply from simple predictions.
The calculator converts sputtered atoms into mass using atomic weight and Avogadro’s number. It then uses density and sputtered area to convert removed mass into thickness.
Avoid using it alone for final production recipes, critical device structures, or unusual materials. In those cases, measured erosion data and process calibration are essential.
Important Note: All the Calculators listed in this site are for educational purpose only and we do not guarentee the accuracy of results. Please do consult with other sources as well.